Simulation and analysis for microstructure profile of optical lithography based on SU-8 thick resist

Profile simulation of optical lithography is very useful for micro-fabrication of microstructure with high sidewall quality. In this paper the light wave propagation, exposure and development process were analyzed, and modeling for thick film lithography was developed to accurately and rapidly obtain simulated results. The effect of exposure dose on the profile quality after development were simulated and discussed, which show that these process parameters have a great impact on the profile quality of microstructure. With guidance of the simulation and analysis, the micro-gear and micro-piston of micro-motor fabricated by SU-8 thick resist were presented.