کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
540232 | 871294 | 2006 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Numerical modeling of SiC–CVD in a horizontal hot-wall reactor
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Numerical modeling of SiC–CVD in a horizontal hot-wall reactor Numerical modeling of SiC–CVD in a horizontal hot-wall reactor](/preview/png/540232.png)
چکیده انگلیسی
A numerical simulation was carried out on SiC–CVD in a horizontal hot-wall reactor. In order to explain the effect of surface polarity, Si-face and C-face, the surface reaction model was improved. Then, the growth processes and doping features of both Si-face and C-face were analyzed. The role of conditions at growing surface, such as surface mass flux of both Si-containing and C-containing species, surface concentration of Si-containing and C-containing species and their ratio, is investigated. Then, the deposition and etching rates, and doping concentration are analyzed as the function of those parameters. In addition, surface morphology of growing epitaxial layer is also investigated in connection with growing surface condition.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 83, Issue 1, January 2006, Pages 100–103
Journal: Microelectronic Engineering - Volume 83, Issue 1, January 2006, Pages 100–103
نویسندگان
Shin-ichi Nishizawa, Michel Pons,