Fabrication of photonic crystal structures on flexible organic light-emitting diodes using nanoimprint

Nanoimprint lithography (NIL) was used to create a film with photonic crystal structures in the organic light-emitting diode (OLED) component. By utilizing various stamps, such as with photonic crystal structures and with grating structures in polymethylmethacrylate (PMMA) were studied. The better formability belongs to a stamp of photonic crystal patterns and molecular weight of PMMA in 350 K and 996 + 15 K in double layers. A photonic crystal with nanostructures in a period of 400 nm was fabricated as a photonic crystal film and was integrated into an organic light emitting diode (OLED). The experiments show that the OLED without photonic crystal films behaves 2.11 cd/m2 for luminous intensity, 2.336 cd/A for lightening efficiency (ηL), and 0.475 lm/W for lightening power (ηP), under the driving voltage of 10 V and current of 0.009012 A; the OLED with the photonic crystal films behaves 250 cd/m2 for luminous intensity and 2.774 cd/A for ηL, and 0.871 lm/W for ηP, under the same driving voltage and same current, which shows that the latter performs well.

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