کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
540436 | 871311 | 2011 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Development of a large area plate-to-plate type UV imprinting tool
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
A UV imprint lithography tool has been developed for micro/nano-scale patterning in an extremely large area, i.e., ∼300 × 400 mm2. To achieve high pattern fidelity, residual-layer thickness uniformity, and an air bubble-free layer in a large area, the UV imprint tool has several main components including a silicon rubber uniform pressurizer, a large area UV-LED module, a vacuum pump, a chuck module, etc. Contact and structural analyses have been performed using commercial FEM packages such as LS-DYNA and ANSYS. The developed tool has been tested, and its performance indices including pattern fidelity and residual-layer thickness uniformity have been measured to be ∼97% and ∼90%, respectively.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 88, Issue 8, August 2011, Pages 2021–2025
Journal: Microelectronic Engineering - Volume 88, Issue 8, August 2011, Pages 2021–2025
نویسندگان
Wonho Choi, Inkoo Kang, Hong Jae Yim, Si-Hyung Lim,