کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
540847 871349 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Frequency and temperature dependent dielectric properties of Al/Si3N4/p-Si(1 0 0) MIS structure
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Frequency and temperature dependent dielectric properties of Al/Si3N4/p-Si(1 0 0) MIS structure
چکیده انگلیسی

The dielectric properties of Al/Si3N4/p-Si(1 0 0) MIS structure were studied from the C–V and G–V measurements in the frequency range of 1 kHz to 1 MHz and temperature range of 80–300 K. Experimental results shows that the ε′ and ε″ are found to decrease with increasing frequency while the value of ε′ and ε″ increase with increasing temperature, especially, above 160 K. As typical values, the dielectric constant ε′ and dielectric loss ε″ have the values of 7.49, 1.03 at 1 kHz, and only 0.9, 0.02 at 1 MHz, respectively. The ac electrical conductivity (σac) increases with both increasing frequency and temperature. The activation energy of 24 meV was calculated from Arrhenius plot at 1 MHz. The results indicate that the interfacial polarization can be more easily occurred at low frequencies and high temperatures.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 84, Issue 1, January 2007, Pages 124–128
نویسندگان
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