کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
540912 1450400 2006 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Ion beam imprinting system for nanofabrication
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Ion beam imprinting system for nanofabrication
چکیده انگلیسی

An ion beam imprinting system has been developed in Lawrence Berkeley National Laboratory. In order to push ion beam imprinting technology to nanometer regime, it is very important to fabricate membranes with arrays of apertures only a few nanometers in diameter. In this article, we describe a simple method of forming nanopore arrays by simultaneously shrinking apertures of micrometer dimensions using plasma-assisted thin-film deposition. Nanopores of 13 nm in diameter and nanoslits of 20 nm in width have been fabricated.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 83, Issues 4–9, April–September 2006, Pages 796–799
نویسندگان
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