کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
540933 | 1450400 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Superhydrophobic surfaces fabricated by nanoimprint lithography
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Superhydrophobic surfaces fabricated by nanoimprint lithography Superhydrophobic surfaces fabricated by nanoimprint lithography](/preview/png/540933.png)
چکیده انگلیسی
Superhydrophobic surfaces were fabricated on silicon by nanoimprint lithography and wet chemical etching. Glass molds were used to imprint a positive photoresist layer. The residual layer in imprinted regions was removed by UV-ozone exposure and subsequent developing of the photoresist. The pattern is transferred to a thin SiO2 layer by buffered hydrofluoric acid etching and then to Si by isotropic hydrofluoric-nitric-acetic acid (HNA) or by anisotropic KOH etching. After coating the samples with a hydrophobic self-assembled monolayer of octadecyltriclorosilane contact angles of water drops were measured and compared to model predictions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 83, Issues 4–9, April–September 2006, Pages 884–888
Journal: Microelectronic Engineering - Volume 83, Issues 4–9, April–September 2006, Pages 884–888
نویسندگان
Alessandro Pozzato, Simone Dal Zilio, Giovanni Fois, Diego Vendramin, Giampaolo Mistura, Michele Belotti, Yong Chen, Marco Natali,