Three-dimensional imaging approach using built-in lens mask lithography

• 3-dimensional imaging through novel complex transparence mask named built-in lens mask is newly proposed.
• To realize 3-dimenstional imaging, superposition of the seed patterns in various depths is approached.
• Novel 3-dimensional imaging for characteristic structure is demonstrated by discretized optical complex transmitting mask by computational lithographic works.

Three-dimensional imaging using a complex transparency mask called a built-in lens mask is proposed in this paper. The mask is designed to have multiple focal planes at arbitrary depths for the seed patterns that form partial components of the three-dimensional structure. Three-dimensional imaging is demonstrated by the superposition of these seed patterns at various depths. Using computational lithography, the optical intensity profiles in space are demonstrated for several characters, and their three-dimensional imaging is confirmed. The separation characteristics of the optical images in the depth direction and the discretization of the complex transmittance of the built-in lens mask is discussed.

Approach for novel 3-dimensional imaging by built-in lens mask lithography.Figure optionsDownload as PowerPoint slide