کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
541486 | 1450395 | 2009 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Application of the hybrid Hopkins–Abbe method in full-chip OPC
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The hybrid Hopkins–Abbe method is presented and shown to resolve the problem of the traditional Hopkins theory, namely the requirement for constant mask diffraction efficiencies. Simulation of electromagnetic scattering from the mask that takes into account the oblique angles of incidence from the illumination is performed by application of the domain decomposition method that is extended for offaxis illumination. Examples of 45 nm and 32 nm lines and spaces through pitch and through focus are presented to demonstrate the validity and accuracy of the hybrid Hopkins–Abbe method. The results obtained are in excellent agreement with a rigorous and independent (third party) simulator.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 86, Issues 4–6, April–June 2009, Pages 492–496
Journal: Microelectronic Engineering - Volume 86, Issues 4–6, April–June 2009, Pages 492–496
نویسندگان
Konstantinos Adam, Michael C. Lam, Nick Cobb, Olivier Toublan,