کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
541500 1450395 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
FIB sputtering optimization using Ion Reverse Software
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
FIB sputtering optimization using Ion Reverse Software
چکیده انگلیسی

This paper experimentally demonstrates that a quantitative description of focused ion beam (FIB) milling (at least for several 3D profiles with inclination not higher than 45°) can be done by means of an isotropic local etching model. Specific characteristic of this model is that it does not account for re-deposition.The paper also presents IonRevSim – Software developed specifically for data preparation and prediction of the shape of the FIB machined structures. Those functions and their operating modes are discussed here in detail and FIB experimental results are provided to verify the algorithms embedded in the software.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 86, Issues 4–6, April–June 2009, Pages 544–547
نویسندگان
, , , , , ,