Nanoscale patterning with the double-layered soft cylindrical stamps by means of UV-nanoimprint lithography

In nanoscale stamp fabrication, the overheads of time, cost and patterning area are soaring. Furthermore, the lifetime of a stamp is affected by the process conditions, particularly the number of times, resist parameters, pressure, and temperature. The fabrication of cylindrical stamps is also rather difficult with some nanoscale patterns. However, if a cylindrical stamp can be fabricated with a nanoscale pattern, improvements can possibly be made with regard to the size of the area, the minimization of costs, and the protection of the master stamp. This paper proposes a process of fabricating a cylindrical double-layered stamp with two different properties. The stamps are verified through the application of a roller-type ultraviolet-nanoimprint lithographical process on the ANT-6R developed by the Korea Institute of Machinery and Materials.