کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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541531 | 1450395 | 2009 | 4 صفحه PDF | دانلود رایگان |
Fluorinated anti-sticking layers (F-ASLs) are generally used to prevent adhesion between molds and resists in nanoimprint lithography (NIL). Nevertheless, these layers are degraded after a certain number of imprints and the mold needs to be cleaned and re-treated. We have observed that the cleaning procedures before re-treatment impacts on the grafting of the fluorinated molecules and on the longevity of the ASL. We propose an efficient cleaning procedure of the damaged anti-sticking layers on both silicon and fused silica molds allowing a reproducible re-deposition. Surface chemistry analyses were conducted using a specific procedure based on X-ray photoelectron spectroscopy (XPS) experiments. This procedure was proven to be suitable for ultra thin organic layer composition analysis.
Journal: Microelectronic Engineering - Volume 86, Issues 4–6, April–June 2009, Pages 669–672