DUV-induced micro and nanopatterning of polymer plasma deposited films

A simple method is described for patterning polymer surfaces with reactive groups. This entails pulsed plasma deposition of anhydride functionalized films, followed by DUV irradiation using a ArF excimer laser. Micro and nano-scale patterning was demonstrated, leading to well defined structures with controlled chemistry and/or geometries. We investigated the chemical changes induced by DUV irradiation. Among other parameters, we demonstrated that the covalent attachment of an amine terminated nucleophile via the aminolysis improved significantly the DUV photosensitivity. Using this approach it was possible to create combinatorial patterned surfaces. In particular such patterned polymer films appear as excellent candidate to study the effect of nanostructuration on the development of biofilms.