کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5416791 | 1506893 | 2010 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Properties of halogen bonds in FArCCX···HMY (X = Cl and Br; M = Be and Mg; Y = H, F, and CH3) complexes: An ab initio and topological analysis
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Properties of halogen bonds in FArCCX···HMY (X = Cl and Br; M = Be and Mg; Y = H, F, and CH3) complexes: An ab initio and topological analysis Properties of halogen bonds in FArCCX···HMY (X = Cl and Br; M = Be and Mg; Y = H, F, and CH3) complexes: An ab initio and topological analysis](/preview/png/5416791.png)
چکیده انگلیسی
The halogen-bonded complexes of FArCCX (XÂ =Â Cl and Br) with HMY (MÂ =Â Be and Mg; YÂ =Â H, F, and CH3) have been studied using ab initio calculations at the MP2/6-311++G(2d,2p) level. The results show that these complexes are stable by a halogen-hydride halogen bond. Its strength is comparable to that of dihydrogen bond and weaker than conventional halogen bond. The properties of FCCX (XÂ =Â Cl and Br) suffer a big change when an Ar atom is inserted into this molecule. The F atom in the HMF makes the complex less stable, whereas the methyl group in the HMCH3 causes the complex more stable. An analysis of atoms in molecules (AIM) has also been performed for these complexes.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Molecular Structure: THEOCHEM - Volume 952, Issues 1â3, 30 July 2010, Pages 115-119
Journal: Journal of Molecular Structure: THEOCHEM - Volume 952, Issues 1â3, 30 July 2010, Pages 115-119
نویسندگان
Shuai Wang,