کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
541680 871484 2008 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes
چکیده انگلیسی

A review of literature combined with recent experimental results addressing the intrinsic and extrinsic factors controlling the effective work function (EWF) of metal gate electrodes on Hf-based high-K dielectrics is discussed. Through a systematic study including accurate extraction of EWF, our observations suggest, unlike popularly perceived, intrinsic Ef-pinning does not limit the EWF tuning on high-K. Also, a critical issue challenging the maintenance of high EWF metals at low effective oxide thicknesses (EOT), due to a new phenomena described as the “Vfb roll-off”, is reported for the first time.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 85, Issue 1, January 2008, Pages 2–8
نویسندگان
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