Study of pressure and proportion influence on the non-LTE plasma composition

In this paper, we use our model with 4T [Modelling of a multi-temperature plasma composition, Chin. Phys. Lett. 22(12) (2005) 3119] to calculate the chemical composition of CH4-Ar. This work is devoted to a study of the effect of the pressure and the Argon abundance on the mixture of non-LTE plasma composition. In other words, to evaluate the pressure and proportion influence on the density of the various species. The electron temperature Te varies in the range 5000-30,000 K.