Study of silicide contacts to SiGe source/drain

NiPt (10% Pt) and Pt were investigated as alternatives to Ni for contact formation to SiGe source/drain. The germanosilicide phase formation and morphology were studied by means of sheet resistance measurements, XRD (X-ray diffraction) analysis and SEM (scanning electron microscopy) inspection. From isochronal and isothermal anneals it is found that NiPt- and Pt-germanosilicide have better thermal stability compared to Ni-germanosilicide. NiPt-germanosilicide degrades morphologically, while still in the monogermanosilicide phase.