کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
541929 1450399 2006 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Microfabrication processes on cylindrical substrates – Part I: Material deposition and removal
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Microfabrication processes on cylindrical substrates – Part I: Material deposition and removal
چکیده انگلیسی

Cylindrical substrates offer a unique geometry for microfabrication processing. This paper describes methods for depositing and removing materials from cylinders ranging in diameter from 85 μm to 3000 μm. Rotary-sputtered thin films are shown to have predictable deposition rates and excellent longitudinal and radial uniformity. Dip-coated films suffer from low radial uniformity and must be individually characterized to predetermine the film thickness applied for a given withdrawal rate. Etch processes display predictable etch rates similar to those for planar substrates.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 83, Issues 11–12, November–December 2006, Pages 2534–2542
نویسندگان
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