Fabrication of hybrid structures using UV roll-typed liquid transfer imprint lithography for large areas

• A roll-typed LTIL process and system for 6 in. wafer is proposed.
• Nanoscale patterns are flawlessly transferred to substrate using the proposed system.
• Nanoscale line and hole patterns are fabricated on large area of micro lens substrate.
• The R-LTIL system could be adapted for the fabrication of 3-D functional devices.

Recently, nanoscale and micro-scale hybrid structures have become the focus of significant research interest due to their potential for use in anti-reflection films, anti-fingerprint films, solar cells, nanofluidic and microfluidic channels, and some functional optical films. Moreover, the nanopatterning lithography systems using roll-typed stamps have become increasingly appealing technologies for undertaking mass production and for continuous fabrication of hybrid patterns on large area substrates. In this study, we propose a roll-typed liquid transfer imprint lithography (R-LTIL) system and process for fabrication of nanoscale and microscale hybrid patterns on flat and micro lens substrates. Using the proposed system, nanoscale patterns that are 350 nm hole and 250 nm in height are flawlessly transferred to 6 in. Si wafer and microscale lens substrates.

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