کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5424951 1395842 2007 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Initial stages of iron silicide formation on the Si(1 0 0)2 Ã— 1 surface
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Initial stages of iron silicide formation on the Si(1 0 0)2 Ã— 1 surface
چکیده انگلیسی

The initial stages of iron silicide growth on the Si(1 0 0)2 × 1 surface during solid-phase synthesis were investigated by photoelectron spectroscopy using synchrotron radiation. The experiments were made on iron films of 1-50 monolayer (ML) thickness in the temperature range from room temperature to 750 °С. Our results support the existence of three stages in the Fe deposition on Si(1 0 0) at room temperature, which include formation of the Fe-Si solid solution, Fe3Si silicide and an iron film. The critical Fe dose necessary for the solid solution to be transformed to the silicide is found to be 5 ML. The solid-phase reaction was found to depend on the deposited metal dose. At 5 ML, the reaction begins at 60 °С, and the solid-phase synthesis leads to the formation of only metastable silicides (FeSi with the CsCl-type structure, γ-FeSi2 and α-FeSi2). A specific feature of this process is Si segregation on the silicide films. At a thickness of 15 ML and more, we observed only stable phases, namely, Fe3Si, ε-FeSi and β-FeSi2.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 601, Issue 21, 1 November 2007, Pages 5069-5076
نویسندگان
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