Fabrication of ZrO2 nanopatterns for biomimetic antireflection by thermal nanoimprint lithography

We present a simple thermal nanoimprint method to fabricate biomimetic moth-eye nanostructures for enhancing transmittance using an ultraviolet (UV) curable perfluoropolyether (PFPE) for the polymer mold and zirconium dioxide (ZrO2) as the imprint material. To transfer the moth-eye nanostructures, a replicated PFPE mold from the Nickel (Ni) master was imprinted onto spin-coated ZrO2 film with a pressure of 6 bar and temperature of 150 °C. The results revealed that imprinted ZrO2 moth-eye nanostructures have excellent property such as transmittance (97.6%) when the both-sided pattern was fabricated on the glass substrate.

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► ZrO2 antireflection structures were imprinted on glass substrate.
► Imprinted nanostructures have excellent antireflection effect.
► Fabricated antireflection structures have good mechanical strength.