کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
543244 | 871644 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Replication of high ordered nano-sphere array by nanoimprint lithography
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Replication of high ordered nano-sphere array by nanoimprint lithography Replication of high ordered nano-sphere array by nanoimprint lithography](/preview/png/543244.png)
چکیده انگلیسی
High ordered nano-sphere array patterns on Si substrate were fabricated using nanoimprint lithography. First, using hot embossing method, poly vinyl chloride (PVC) based polymer replica template was duplicated from original high ordered nano-sphere array patterns, which was fabricated by evaporation method. The monolayer transferring condition can be achieved by varying hot embossing pressure. Then, through UV nanoimprint lithography with the replicated polymer template, imprinted patterns, which has high ordered nano-sphere array patterns, was successfully fabricated on Si and flexible PET substrate.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 86, Issue 12, December 2009, Pages 2423–2426
Journal: Microelectronic Engineering - Volume 86, Issue 12, December 2009, Pages 2423–2426
نویسندگان
Sung-Hoon Hong, Byeong-Ju Bae, Jae-Yeon Hwang, Seon-Yong Hwang, Heon Lee,