کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
543270 | 871649 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Enhanced gate induced drain leakage current in HfO2 MOSFETs
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Enhanced gate induced drain leakage current in HfO2 MOSFETs Enhanced gate induced drain leakage current in HfO2 MOSFETs](/preview/png/543270.png)
چکیده انگلیسی
The substrate current of high-κ dielectric MOSFETs has been studied using dc sweep and transient (down to 100 μs per I-V curve) electrical measurements. These measurements reveal trap-assisted substrate current components in addition to the traditional bell-shaped impact ionization current. By separating the transversal and lateral electric field contributions, the gate induced drain leakage (GIDL) is shown to dominate the substrate current at low gate biases. At high gate biases, tunneling of valence band electrons from the bulk to the gate dominates. The results show that the GIDL current is the result of band-to-band tunneling assisted by traps located at the HfO2/SiO2 interface and transition layer, and not the result of oxide charging.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 86, Issue 11, November 2009, Pages 2157-2160
Journal: Microelectronic Engineering - Volume 86, Issue 11, November 2009, Pages 2157-2160
نویسندگان
Moshe Gurfinkel, John S. Suehle, Yoram Shapira,