کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
543689 1450396 2008 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Design and fabrication using nanoimprint lithography of a nanofluidic device for DNA stretching applications
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Design and fabrication using nanoimprint lithography of a nanofluidic device for DNA stretching applications
چکیده انگلیسی

In this work, we present the design and fabrication of a sealed micro/nanofluidic chip for DNA stretching applications, based on the use of the high-throughput nanoimprint lithography (NIL) technology combined with a conventional anodic bonding of the silicon base and Pyrex cover. Using the developed fabrication process sub-100 nm width nanochannels have been obtained. The complete chip, including microchannels for fluid transport and nanochannels for DNA stretching and visualization has been fabricated and packaged to facilitate the contact with the macroscopic world.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 85, Issues 5–6, May–June 2008, Pages 818–821
نویسندگان
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