کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
543715 | 1450396 | 2008 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Control of duty ratio in waveguide gratings using a near-field holographic lithography system with a variable aperture
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
A waveguide grating coupler has been developed for optical coupling between a planar waveguide and an optical fiber by some researchers. In a waveguide grating coupler, the shape of diffracted output beam profiles and their focusing performance are dependent on the variations of duty ratios. Therefore, a control of duty ratio in waveguide grating is important for more efficient optical coupling. However, the patterning of a non-uniform duty ratio in waveguide grating is generally very difficult to realize. In our experiments, we propose a new simple fabrication method, which is a variable aperture system incorporating to near-field holographic (NFH) lithography system, to realize a non-uniform duty ratio in waveguide gratings.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 85, Issues 5–6, May–June 2008, Pages 925–928
Journal: Microelectronic Engineering - Volume 85, Issues 5–6, May–June 2008, Pages 925–928
نویسندگان
Jun-Ho Sung, Jeong-Su Yang, Bo-Soon Kim, Chul-Hyun Choi, Min-Woo Lee, Seung-Gol Lee, Se-Geun Park, El-Hang Lee, Beom-Hoan O,