Comparing GaAs and In0.15Ga0.85As as channel material for alternative substrate CMOS

Photoluminescence intensity (PLI) measurements of GaAs and InGaAs thin films indicate that InGaAs might be inherently easier to passivate than GaAs. The introduction of just 15% of In leads to a reduction of the surface recombination velocity at native oxide interfaces by an order of magnitude. This is more than the effect expected by a reduced bandgap alone. The PLI method applied to thin films can also be used to determine the surface recombination velocity of other IIIV-oxide interfaces.