کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
544026 | 871702 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Evaluation of the junction delineation accuracy and reproducibility with the SSRM technique
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Within this work, we have studied ultrathin n- and p-type extension implants in order to evaluate the junction delineation accuracy and reproducibility of the SSRM technique on ultra-shallow implants. This is a challenging task since it needs a technique that has simultaneously good sensitivity (<10%), high spatial resolution (1–3 nm) and high dopant gradient resolution (1–2 nm/dec). For every device, two different samples were prepared and measured separately. Unparallel reproducibility capabilities of the technique have been demonstrated as well as a sub-nanometer reproducibility for the lateral diffusion analysis. Regarding junction depths, reproducibility is 1–3 nm where the main uncertainty is the varying silicide thickness.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 84, Issue 3, March 2007, Pages 437–440
Journal: Microelectronic Engineering - Volume 84, Issue 3, March 2007, Pages 437–440
نویسندگان
Pierre Eyben, Danielle Vanhaeren, Tom Janssens, Thomas Hantschel, Wilfried Vandervorst, Kanna Adachi, Kazunari Ishimaru,