کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
544031 871702 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Mapping stress and strain in nanostructures by high-resolution transmission electron microscopy
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Mapping stress and strain in nanostructures by high-resolution transmission electron microscopy
چکیده انگلیسی

We present the current state-of-the-art of geometric phase analysis (GPA), a technique for measuring stress and strain at the nanoscale by high-resolution transmission electron microscopy (HRTEM). The method will be illustrated with an experimental study of SiGe strained layers using the SACTEM-Toulouse, an aberration-corrected transmission electron microscope. This latest generation machine improves signal-to-noise allowing deformations to be measured to an accuracy of 0.1% at nanometre scale resolution. The relation between strain and deformation will be discussed in the light of thin film relaxation and chemical interdiffusion.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 84, Issue 3, March 2007, Pages 460–463
نویسندگان
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