کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
544303 1450371 2013 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Fabrication of inverse micro/nano pyramid structures using soft UV-NIL and wet chemical methods for residual layer removal and Si-etching
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Fabrication of inverse micro/nano pyramid structures using soft UV-NIL and wet chemical methods for residual layer removal and Si-etching
چکیده انگلیسی


• We present a novel and simple fabrication method for residual layer removal.
• No dry etching step was applied for residual layer removal.
• The method uses only wet chemical etching.
• Micro- & nano inverted pyramids were fabricated on Si-substrate as application.

In this study we present a novel and simple fabrication method for micro- and nano-scale inverse pyramidal structures by a combination of soft UV-NIL and wet chemical etchings. The unique feature of our method is the absence of a RIE process, which is usually applied for removal of residual layer. This is achieved by modifying the imprint resist with an O2-plasma in asher and subsequent wet etching of residual layer by diluted HF. Combined with conventional anisotropic wet etching step with KOH/IPA, our method allows cost effective fabrication of inverse pyramidal structures on Si-substrate in batch process. Such structures in nano- and micro scale are particularly suitable for light management in photovoltaic, solid state lighting and silicon based photonic.

Figure optionsDownload as PowerPoint slide

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 110, October 2013, Pages 403–407
نویسندگان
, , , ,