کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
544506 | 871766 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Press and release imprint: Control of the flexible mold deformation and the local variation of residual layer thickness in soft UV-NIL
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Press and release imprint: Control of the flexible mold deformation and the local variation of residual layer thickness in soft UV-NIL Press and release imprint: Control of the flexible mold deformation and the local variation of residual layer thickness in soft UV-NIL](/preview/png/544506.png)
چکیده انگلیسی
We report on a two step soft UV nanoimprint process termed “Press and Release Imprint (PRI) that enables the reduction of both the mold deformation and the local variation of the residual layer thickness, thereby allowing high fidelity pattern replication with a uniform local residual layer thickness. The effect of imprint pressure on the mold deformation, local variation of residual layer thickness as well as required mold release time has been investigated for microscale patterns in the range of 10–100 μm. The potentials of PRI are demonstrated by high fidelity replication of micro-patterns with a uniform residual layer of minimum thickness.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 88, Issue 6, June 2011, Pages 1033–1036
Journal: Microelectronic Engineering - Volume 88, Issue 6, June 2011, Pages 1033–1036
نویسندگان
Namil Koo, Martin Otto, Jung Wuk Kim, Jun-Ho Jeong, Heinrich Kurz,