کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
544999 | 871799 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Improved etching method for microelectronic devices with supercritical carbon dioxide
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Aqueous etchants used in traditional wet etching for the production of integrated circuits and MEMS devices hinder the processes and pose environmental difficulties. Therefore, we developed an improved dry etching method with HF/Pyridine (7:3) in supercritical carbon dioxide. Etch rates of BPSG, P-TEOS, Thermal SiO2 and SiN with dry etching method were several times higher than those in wet etching. Etch rates were found to be a function of temperature, HF concentration, and the kind of co-solvents. The presence of alcoholic co-solvents, especially IPA with HF/Pyridine etchant greatly increased the etch rate of BPSG. Etch selectivity could be controlled with the etchant concentration.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 86, Issue 2, February 2009, Pages 128–131
Journal: Microelectronic Engineering - Volume 86, Issue 2, February 2009, Pages 128–131
نویسندگان
Jae Hyun Bae, Md. Zahangir Alam, Jae Mok Jung, Yeong-Soon Gal, Hyosan Lee, Hyun Gyu Kim, Kwon Taek Lim,