Simple fabrication of nanostructure by continuous rigiflex imprinting

A continuous rigiflex imprinting (CRIM) is presented that is suitable for mass production of nano scale patterns. The use of a “rigiflex” mold, which is rigid enough for sub-100 nm patterning and yet flexible enough in its film form for roll printing, makes it possible to realize “continuous” imprinting and the substrate surface can be made exposed in the course of the imprinting with a rubbery mold. With the configuration of the CRIM process, the lateral collapse problem of the patterned features is eliminated. The lateral collapse can also be controlled to lead to corrugated nanostructures.