Solution-processed HfGdO gate dielectric thin films for CMOS application: Effect of annealing temperature

Solution-processed HfGdO gate dielectric thin films for CMOS application: Effect of annealing temperature

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 731, 15 January 2018, Pages 150-155

W.D. Li, G. He, C.Y. Zheng, S. Liang, L. Zhu, S.S. Jiang,