کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5458032 | 1516163 | 2018 | 19 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effects of Mg content and annealing treatment on optical and electrical properties of CuMg and ITO/CuMg metallic glass films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
CuMg (CM) and ITO/CuMg (ICM) films with Mg contents ranging from 30 to 65 at% are deposited on glass substrates and are then treated by furnace annealing and laser annealing. The structural, optical and electrical properties of the as-deposited and annealed samples are investigated and compared. It is shown that as the Mg content increases, the sheet resistance of the CM film increases, while the transmittance decreases. For a Mg content of 49 at%, the bi-layer ITO/CM structure improves the transmittance from 62.6% (CM) to 75.6% (ICM) and reduces the resistance from 51.3 Ω/â¡ (CM) to 49.5 Ω/â¡ (ICM). Moreover, following furnace annealing at 200 °C, the transmittance of the ICM sample is further improved to 78.5% while the sheet resistance is reduced to 32.4 Ω/â¡. The corresponding figure of merit is equal to 2.74 Ã 10â3 Ωâ1, and is thus similar to that of commercial ITO film (2.68 Ã 10â3 Ωâ1). The optimal laser annealing parameters for the Cu51Mg49 ICM sample are found to be a pulse energy of 1 μJ and a repetition rate of 250 kHz. Given the use of these parameters, the ICM film has a transmittance of 77.5% and a sheet resistance of 26.5 Ω/â¡. The corresponding figure of merit has a value of 2.94 Ã 10â3 Ωâ1. Finally, the relative change in resistivity of the as-deposited Cu43Mg57 ICM sample following fatigue testing with a bend radius of 7 mm (ÎR/R0 = 0.21) is significantly lower than that of a pure ITO film of roughly equivalent thickness (ÎR/R0 = 0.93).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 731, 15 January 2018, Pages 248-252
Journal: Journal of Alloys and Compounds - Volume 731, 15 January 2018, Pages 248-252
نویسندگان
H.K. Lin, S.Z. Hong,