کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5466747 1518300 2017 27 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Focused ion beam-assisted fabrication of soft high-aspect ratio silicon nanowire atomic force microscopy probes
ترجمه فارسی عنوان
تولید یون های متمرکز با کمک نرم افزارهای میکروسکوپ نیروی اتمی نانوسیم سیلیکون نسبتا نرم نسبتا بالا
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
In this study, high-aspect ratio silicon nanowire (SiNW) - modified atomic force microscopy (AFM) probes are fabricated using focused ion beam (FIB) microfabrication technology and vapor-solid-solid synthesis. Commercially available soft silicon nitride probes are used for localized nanowire growth yielding soft high-aspect ratio AFM probes. The SiNW-modified cantilevers are used here for imaging in PeakForce Tappingۛ (PFT) mode, which offers high force control along with valuable information about tip-sample adhesion. A platinum catalyst, deposited accurately at a truncated AFM tip by ion beam-induced deposition (IBID), was used for localized nanowire synthesis. It could be shown that the deposition of a thin silicon dioxide layer prior to the catalyst deposition resulted in controlled SiNW growth on silicon as well as silicon nitride probes. In addition, a FIB-based method for post-growth alignment of the fabricated SiNW tips is presented, which allows tilt-compensation specifically tailored to the specifications of the used AFM instrumentation. To demonstrate the capability of such soft, high-aspect ratio AFM probes, optical gratings fabricated in GaAs and silver halide fibers were imaged in PFT mode. Additionally, the mechanical stability of these high-aspect AFM probes was evaluated on a sapphire substrate.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ultramicroscopy - Volume 179, August 2017, Pages 24-32
نویسندگان
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