کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5489360 | 1524366 | 2017 | 37 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Crystalline polarity of ZnO thin films deposited under dc external bias on various substrates
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Effects of the nature of substrates, either crystalline or non-crystalline, on the structure and properties of ZnO films deposited by sputtering were investigated. This study focuses mainly on the role of the external electric bias applied to substrates during magnetron sputtering deposition in controlling crystalline polarity, i.e., Zn-face or O-face, and the resulting film properties. It was found that polarity control was achieved on silica and silicon substrates but not on sapphire substrates. The substrate bias did influence the lattice parameters in the structural formation; however, the selection of the substrate type had a significant influence on the defect structures and the film properties.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 463, 1 April 2017, Pages 38-45
Journal: Journal of Crystal Growth - Volume 463, 1 April 2017, Pages 38-45
نویسندگان
Takeo Ohsawa, Kei Tsunoda, Benjamin Dierre, Caroline Zellhofer, Sergey Grachev, Hervé Montigaud, Takamasa Ishigaki, Naoki Ohashi,