کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5489421 | 1524358 | 2017 | 16 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Development of InAlAsSb growth by MOVPE
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موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The growth of InAlAsSb by metal-organic vapor phase epitaxy has been demonstrated, with a controllable antimony fraction exceeding 6%. Calculations have shown that InAlAsSb with Sb contents greater than 5-7% in the quaternary are within the miscibility gap, however this work demonstrates specific growth conditions that allow compositions well within the miscibility gap. From a study of the growth of AlAsSb and an evaluation of two aluminum precursors (TMAl versus TTBAl), growth temperature, and V/III ratio, a foundation is developed to optimize the growth of InAlAsSb. By tailoring V/III ratio, growth conditions were found to achieve high crystalline content of both indium and antimony. InAlAsSb was grown on InP with antimony fractions from 32% to 48%, for which indium fraction varied from 10% to 19%, which provides an expected direct bandgap ranging from 1.75 to 1.98Â eV.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 471, 1 August 2017, Pages 15-20
Journal: Journal of Crystal Growth - Volume 471, 1 August 2017, Pages 15-20
نویسندگان
Michael Slocum, David V. Forbes, Glen C. Hillier, Brittany L. Smith, Jessica G.J. Adams, Seth M. Hubbard,