کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5860402 | 1133184 | 2013 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The role of potassium channel in silica nanoparticle-induced inflammatory effect in human vascular endothelial cells in vitro
ترجمه فارسی عنوان
نقش کانال پتاسیم در اثر التهابی ناشی از نانوذرات سیلیکا در سلول های اندوتلیال عروق انسانی در آزمایشگاهی
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کلمات کلیدی
کانال پتاسیم، پچ گیر نانوذرات سیلیکا، سلولهای اندوتلیال عروق انسانی، التهاب
موضوعات مرتبط
علوم زیستی و بیوفناوری
علوم محیط زیست
بهداشت، سم شناسی و جهش زایی
چکیده انگلیسی
Exposure to nanoparticles became popular in industry and daily life. Nano-SiO2 was shown to have an adverse effect to vascular endothelial cell although the mechanisms remain unclear. To test whether the nano-SiO2's harmful effect was related to the potassium channel, human umbilical vascular endothelial cells (HUVECs) were treated with nano-SiO2 in different dose. Cell survival rate and lactate dehydrogenase (LDH) as cytotoxic parameters, tumor necrosis factor-α (TNF-α) and interleukin-6 (IL-6) as inflammation indicators were determined. The electrophysiological changes and function of potassium channel were detected with patch clamp and channel blockers. It was found that nano-SiO2 exposure decreased cell survival rate, increased LDH leakage, TNF-α and IL-6 production. The potassium channel activity was increased in the opening rate and current intensity. Furthermore, potassium channel blockers tetraethylammonium (TEA), 4-amino pyridine (4-AP), and margatoxin (MGTX) reduced the nano-SiO2-induced cytotoxity and inflammation, i.e., increase in the cell survival rate, and decrease in the LDH leakage and production of TNF-α and IL-6. It might be concluded that the nano-SiO2-induced inflammation and cytotoxicity at HUVECs was associated with the activation of potassium channel.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Toxicology Letters - Volume 223, Issue 1, 23 October 2013, Pages 16-24
Journal: Toxicology Letters - Volume 223, Issue 1, 23 October 2013, Pages 16-24
نویسندگان
Li Yang, Qinqian Yan, Jing Zhao, Jun Li, Xuecong Zong, Lei Yang, Zhenglun Wang,