کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
595065 1454000 2010 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
A facile method to improve tribological properties of silicon surface by combining nanogrooves patterning and thin film lubrication
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی شیمی کلوئیدی و سطحی
پیش نمایش صفحه اول مقاله
A facile method to improve tribological properties of silicon surface by combining nanogrooves patterning and thin film lubrication
چکیده انگلیسی

Surface micro/nanohierarchical structure designing and thin film lubrication are two main methods to alleviate adhesive and frictional problems encountered by micro/nanoelectromechanical systems (MEMS/NEMS). In this study, silicon surfaces with micro/nano grooves were prepared by photolithography and further chemically modified by multiply-alkylated cyclopentane (MAC) thin films to improve the tribological behaviors of MEMS/NEMS. The effects of nanoscaled roughness (including groove pitch and groove fractional surface coverage) and chemical modification on the wetting and tribological properties of surfaces were systemically investigated. The results of contact angle measurement indicated that the surface hydrophilicity decreases with increasing of surface roughness and lowering of the surface energy (chemical treatment with MACs). Tribological study showed that with the increasing of nanoscale roughness and combined with chemical modification, the tribological properties are greatly improved, which may be affected by real area of contact and the surface chemistry.

Figure optionsDownload as PowerPoint slideResearch highlights▶ MACs thin film modified silicon surfaces with micro/nano grooves were prepared. ▶ The surface hydrophilicity of MACs film modified silicon with grooves decreases. ▶ The micro/nanotribological properties are improved greatly. ▶ The improvement could be due to the increasing area density and chemical treatment.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Colloids and Surfaces A: Physicochemical and Engineering Aspects - Volume 372, Issues 1–3, 3 December 2010, Pages 139–145
نویسندگان
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