EUV photofragmentation and oxidation of a polyarylene - Sulfonium resist: XPS and NEXAFS study

EUV photofragmentation and oxidation of a polyarylene - Sulfonium resist: XPS and NEXAFS study

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Photochemistry and Photobiology A: Chemistry - Volume 364, 1 September 2018, Pages 373-381

Guilherme Kretzmann Belmonte, Cleverson Alves da Silva Moura, Pulikanti Guruprasad Reddy, Kenneth E. Gonsalves, Daniel Eduardo Weibel,