Fabrication of atomic single layer graphitic-C3N4 and its high performance of photocatalytic disinfection under visible light irradiation

- Atomic single layer g-C3N4 was fabricated by a simple mechanical exfoliation method.
- The single layer g-C3N4 exhibited high photocatalytic disinfection performance.
- Photocataytic disinfection over a simple metal-free photocatalyst is achieved.
- This study will facilitate development of safe and reliable disinfection technology.