SiH4 enhanced dissociation via argon plasma assistance for hydrogenated microcrystalline silicon thin-film deposition and application in tandem solar cells

SiH4 enhanced dissociation via argon plasma assistance for hydrogenated microcrystalline silicon thin-film deposition and application in tandem solar cells

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solar Energy Materials and Solar Cells - Volume 180, 15 June 2018, Pages 110-117

Tiantian Li, Shengzhi Xu, Qian Huang, Huizhi Ren, Jian Ni, Baozhang Li, Dekun Zhang, Changchun Wei, Eleftherios Amanatides, Dimitrios Mataras, Ying Zhao, Xiaodan Zhang,