کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
6536195 | 49325 | 2013 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Epitaxial undoped indium oxide thin films: Structural and physical properties
ترجمه فارسی عنوان
الیاف نازک الیاف اپتیکسال غیر فعال: خواص ساختاری و فیزیکی
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کلمات کلیدی
اکسید هیدروژن، فیلم های نازک خواص نوری و الکتریکی،
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
کاتالیزور
چکیده انگلیسی
Indium oxide thin films were grown by the pulsed electron beam deposition method on c-cut sapphire substrates at 10â2 mbar oxygen pressure and temperature up to 500 °C. Such conditions lead to the formation of dense, smooth and stoichiometric In2O3 films, with the cubic bixbyite structure. Epitaxial thin films were obtained at substrate temperatures as low as 200 °C. Pole figure measurements indicate the existence of (111) oriented In2O3 crystallites with different in-plane symmetry, i.e. three-fold and six-fold symmetry. The origin of this effect may be related to the specificities of the growth method which can induce a large disorder in the oxygen network of In2O3, leading then to a six-fold symmetry in the (111) plane of the bixbyite structure. This temperature resistivity behaviour shows metallic conductivity at room temperature and a metal-semiconductor transition at low temperature for In2O3 films grown at 200 °C, while the classical semiconductor behaviour was observed for the films grown at 400 and 500 °C. A maximum mobility of 24.7 cm2/V s was measured at 200 °C, and then it falls off with improving the crystalline quality of films. The optical transparency is high (>80%) in a spectral range from 500 nm to 900 nm.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solar Energy Materials and Solar Cells - Volume 116, September 2013, Pages 34-42
Journal: Solar Energy Materials and Solar Cells - Volume 116, September 2013, Pages 34-42
نویسندگان
W. Seiler, M. Nistor, C. Hebert, J. Perrière,