H2-CH4 mixed gas plasma treatment on LP-MOCVD ZnO:B for amorphous silicon thin film solar cells

H2-CH4 mixed gas plasma treatment on LP-MOCVD ZnO:B for amorphous silicon thin film solar cells

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solar Energy Materials and Solar Cells - Volume 116, September 2013, Pages 231-237

Li Wang, Xiaodan Zhang, Xu Yang, Changchun Wei, Xinliang Chen, Ying Zhao,