کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
6578402 | 1422927 | 2018 | 40 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Dimethyl phthalate contaminated soil remediation by dielectric barrier discharge: Performance and residual toxicity
ترجمه فارسی عنوان
بازسازی دی اتیل فتالات خاک آلوده شده توسط تخلیه دیواره الکتریکی: عملکرد و سمیت باقی مانده
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کلمات کلیدی
دی متیل فتالیت، تخلیه مانع دی الکتریک، اصلاح خاک، جوانه زنی دانه، سمی بودن
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
مهندسی شیمی (عمومی)
چکیده انگلیسی
Phthalates, as additives in the plastic production process, were able to enter the soil, causing huge risks to soil environment and human health. The potential of phthalates elimination in soil using dielectric barrier discharge (DBD) plasma was evaluated, with dimethyl phthalate (DMP) as a model pollutant. The experimental results demonstrated that DMP in soil could be decomposed by the DBD plasma oxidation. DMP concentration was reduced from 200â¯mgâ¯kgâ1 to 87â¯mgâ¯kgâ1 after 60â¯min's DBD plasma oxidation, and its decomposition process fitted well with the first-order kinetics. Soil moisture was an important parameter affecting DMP decomposition in soil. Lower initial concentration was beneficial for DMP degradation. Analysis on types and action ranges of reactive oxygen species participating in DMP decomposition demonstrated that oxygen-containing species and electron played crucial roles. DMP molecular structure was destroyed in the DBD plasma processing, and phthalic acid monomethyl ester, phthalic acid, acetic acid, and oxalic acid were detected as the main intermediates. DBD plasma oxidation decreased the toxicity of DMP to seed germination and growth. Germination rate of wheat seed and activity of root system both increased, while free radical damage to cell membrane was significantly alleviated after 60â¯min's DBD plasma oxidation.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Chemical Engineering Journal - Volume 351, 1 November 2018, Pages 1076-1084
Journal: Chemical Engineering Journal - Volume 351, 1 November 2018, Pages 1076-1084
نویسندگان
Hanzhong Jia, Yang Cao, Guangzhou Qu, Tiecheng Wang, Xuetao Guo, Tianjiao Xia,