کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
6613111 459593 2014 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Passivity Breakdown on Copper: Influence of Chloride Ion
ترجمه فارسی عنوان
خرابی گذرا بر روی مس: تاثیر یون کلرید
کلمات کلیدی
فلز مس، محلول حاوی سولفید، شکستگی گذرا، مدل نقص نقطه، یون کلرید،
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
چکیده انگلیسی
Passivity breakdown and pitting on pure copper, the assumed material for the outer canisters for the isolation of high-level nuclear waste in Sweden and Finland, has been studied in simulated, sulfide- and chloride-containing granitic rock groundwater and the data are interpreted in terms of the Point Defect Model (PDM). The near normal distribution in the critical breakdown potential (Vc) measured in deaerated sodium sulfide solutions with different chloride concentrations and for variable pH (= 8-10) is in satisfactory agreement with the quantitative prediction of the PDM. The critical areal concentration of condensed cation vacancies at the metal/film interface that leads to passivity breakdown, as predicted by the PDM from the experimental dependence of the Vc on the square root of the voltage sweep rate, ξ < 1.09 × 1015 cm−2, is in excellent agreement with that calculated from the unit cell dimensions of the substrate Cu (ξ ≈ 1.53 × 1015 cm−2) and the barrier layer sulfide (Cu2S) (ξ ≈ 7.66 × 1014 cm−2) for vacancy condensation upon the metal lattice or upon the cation sublattice of the film, respectively. This observation provides convincing evidence for the validity of the PDM for modeling passivity breakdown on Cu sulfide- and chloride-containing granitic rock groundwater.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 144, 20 October 2014, Pages 391-399
نویسندگان
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