کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
6615695 | 459622 | 2013 | 11 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Scanning droplet cell microscopy on a wide range hafnium-niobium thin film combinatorial library
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Scanning droplet cell microscopy on a wide range hafnium-niobium thin film combinatorial library Scanning droplet cell microscopy on a wide range hafnium-niobium thin film combinatorial library](/preview/png/6615695.png)
چکیده انگلیسی
A wide-range thin film Hf-Nb combinatorial library deposited by co-sputtering is studied. The microstructure and crystallographic properties of the thin film alloys locally investigated by SEM and GIXRD are mapped along the entire compositional spread from 14 to 94Â at.% Nb. Scanning droplet cell microscopy (SDCM) is used for mapping the electrochemical properties of the naturally oxidised metallic surfaces. Anodisation of the Hf-Nb thin films alloys is achieved with a high throughput due to computer-controlled scanning, made with a composition resolution of 1Â at.%. The electrical properties of the anodic oxides are mapped by EIS and a maximum electrical permittivity close to 75 was found for Hf-33Â at.% Nb. Semiconducting properties of the mixed anodic oxides are studied using Mott-Schottky analysis and their composition and mixing is investigated by XPS depth profiling.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 110, 1 November 2013, Pages 539-549
Journal: Electrochimica Acta - Volume 110, 1 November 2013, Pages 539-549
نویسندگان
Andrei Ionut Mardare, Alfred Ludwig, Alan Savan, Achim Walter Hassel,