Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility

Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 155, 2 April 2016, Pages 55-60

Daniel Fan, Elizabeth Buitrago, Shumin Yang, Waiz Karim, Yanqing Wu, Renzhong Tai, Yasin Ekinci,