UV-NIL based nanostructuring of aluminum using a novel organic imprint resist demonstrated for 100 nm half-pitch wire grid polarizer

UV-NIL based nanostructuring of aluminum using a novel organic imprint resist demonstrated for 100 nm half-pitch wire grid polarizer

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 155, 2 April 2016, Pages 118-121

Florian Schlachter, Julian Barnett, Ulrich Plachetka, Christoph Nowak, Martin Messerschmidt, Manuel Thesen, Heinrich Kurz,