Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks

Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 141, 15 June 2015, Pages 289-293

Joachim Zajadacz, Pierre Lorenz, Frank Frost, Renate Fechner, Christian Steinberg, Hella-Christin Scheer, Klaus Zimmer,